Levchenko, I.V., G.P. Malanych, V.M. Tomashyk, and I.B. Stratiychuk. “Influence of the C4H6O6 Concentration in the (NH4)2Cr2O7 HBr C4H6O6 Composition on the Chemical-Dynamic Polishing of the III-V Semiconductors”. Physics and Chemistry of Solid State 17, no. 4 (December 15, 2016): 604–610. Accessed May 3, 2024. https://scijournals.pnu.edu.ua/index.php/pcss/article/view/1236.