NICHKALO, S.I.; SHEPIDA, M.V.; CHEKAYLO, M.V. Optimal Conditions for the Deposition of Gold Nanofilms on a Silicon by Galvanic Replacement Method . Physics and Chemistry of Solid State, [S. l.], v. 20, n. 3, p. 234–238, 2019. DOI: 10.15330/pcss.20.3.234-238. Disponível em: https://scijournals.pnu.edu.ua/index.php/pcss/article/view/612. Acesso em: 29 apr. 2024.